Temporal extension of stable glow discharges in fluorine-based excimer laser gas mixtures by the addition of xenon

The effect of addition of xenon on the long term homogeneity of discharges in F2 and ArF excimer laser gas mixtures was investigated in a small-volume discharge chamber. The gas mixture in the discharge chamber was preionized by X-rays. A special electrical excitation circuit containing a pulse forming line provided a long, squareshaped current pumping pulse of a predetermined duration to the discharge electrodes. The initiation and the development of the discharge was monitored via its fluorescence signal with an intensified CCD camera. We found that adding Xe up to partial pressures of 0.53 mbar extended the homogeneous phase of the discharge from 80 ns to approximately 200 ns in He/F2 as well as in He/Ar/F2 and Ne/Ar/F2 excimer laser gas mixtures. Monitoring of the ArF and XeF spontaneous emission signals showed that the formation of ArF excimers remained unaffected by the addition of xenon (up to 1.3 mbar) to the laser gas mixture. PACS 42.55.Lt · 42.60.Lh · 52.80.-s